Plasma etching is an etching technology used in microfabrication. It uses chemically reactive plasmas to remove material deposited on surfaces such as silicon wafers. The plasma is generated under low pressure (vacuum) and in addition with certian etching gases. Plasma sources can either be high frequency or microwave based. High energy ions or chemically active radical species, created with the help of the plasma, attac the surface and react with it.
JE PlasmaConsult GmbH offers for plasma etching single plasma sources as well as complete plasma systems and diagnostic equipment for industrial and R&D applications.
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