Plasma systems

 

 

 

 

 

 

 

 

  

Magnetron Sputter Coating System MSC-3

 

Features

  • Up to 4 water cooled magnetron sputter sources

  • Excellent thickness uniformity

  • Compatible with chemically reactive and non reactive gases

  • Rotateable and movable substrate holder

Custom design on request

 

Applications

  • Optical coatings

  • Scratch resistant films

  • Transparent and conductive films

  • Antireflective films

  • Decorative films

 

The PlasmaConsult Magnetron Sputter Coating System MSC-3 consists of five main components:

  •    Up to four water cooled planar 3” magnetron sputter sources mounted on a DN 400 ISO-K flange and RF (13.56 MHz) or DC power generator

  •     The main vacuum chamber incl. access door and vacuum inlet for the working gases. The main vacuum chamber is equipped with vent valve and two pressure gauges.

  •     The substrate holder mounted on a DN ISO-K flange, movable and rotateable.

  •     the pumping system consisting of a turbo molecular pump and a two stage rotary vane pump as forevacuum pump.

  •     The gas distribution system incl. two mass flow controllers and electronic control unit

 

 

Technical data

Magnetron sputter sources

Max. power (DC)                  1.250 W

Max. power (RF)                   750 W

Pressure range:                     3 x 10-3 - 10-1 mbar

Max. target size                     3"

max. substrate size                4"            

Base pressure:                        <10-5 mbar