This plasma system is based on a planar HCD plasma source to produce high plasma and radical species densities with excellent homogeneity at an affordable price. Learn more about applications using the PlasCon HCD in our Tech Library.

The ICP-PECVD system uses an inductively coupled plasma source for plasma generation with high plasma densities. The system is ideal for high quality thin film coating such as DLC or optical coatings for example. Learn more about applications using the ICP-PECVD System in our Tech Library.

Our magnetron sputter system uses up to 4 different sputter sources and a movable substrate holder. Therefore coatings with excellent uniformity can be produced. Learn more about applications using the MSC-3 in our Tech Library.

The SteriPlas system is designed for industrial low temperature (<50° C) sterilization. It employs the worlds largest plasma sterilizing chamber of up to 3000 liters.

Please click on the pictures for more information or call our specialist:

Dr. Axel Schwabedissen: +49 202 -28397-121

If you need further information about our product range please click here